Preparation of photoresist-derived carbon micropatterns by proton ion beam lithography and pyrolysis

서지정보

ㆍ발행기관 : 한국탄소학회 ㆍ수록지정보 : Carbon letters / 24권
ㆍ저자명 : Hui-Gyun Nam, Jin-Mook Jung, In-Tae Hwang, Junhwa Shin, Chang-Hee Jung, Jae-Hak Choi

목차

Abstract
1. Introduction
2. Experimental
2.1. Materials
2.2. Preparation of SU-8 micropatterns byPIBL
2.3. Preparation of CMs by pyrolysis of SU-8micropatterns
2.4. Characterization
3. Results and Discussion
4. Conclusions
Conflict of Interest
Acknowledgements
References

영어 초록

Carbon micropatterns (CMs) were fabricated from a negative-type SU-8 photoresist by proton ion beam lithography and pyrolysis. Well-defined negative-type SU-8 micropatterns were formed by proton ion beam lithography at the optimized fluence of 1×1015 ions cm–2 and then pyrolyzed to form CMs. The crosslinked network structures formed by proton irradiation were converted to pseudo-graphitic structures by pyrolysis. The fabricated CMs showed a good electrical conductivity of 1.58×102 S cm–1 and a very low surface roughness.

참고 자료

없음